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首页> 外文期刊>CERAMICS INTERNATIONAL >Investigation of Tb-doping on structural transition and multiferroic properties of BiFeO_3 thin films
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Investigation of Tb-doping on structural transition and multiferroic properties of BiFeO_3 thin films

机译:Tb掺杂对BiFeO_3薄膜的结构转变和多铁性的影响

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Pure BiFeO_3 (BFO) and Bi_(1-x)Tb_xFeO_3 (BTFO) thin films were successfully prepared on FTO (fluorine doped tin oxide) substrates by the sol-gel spin-coating method. The effects of Tb-doping on the structural transition, leakage current, and dielectric and multiferroic properties of the BTFO thin films have been investigated systematically. XRD, Rietveld refinement and Raman spectroscopy results clearly reveal that a structural transition occurs from the rhombohedral (R3c:R) to the biphasic structure (R3c:H+R-3m:R) with Tb-doping. The leakage current density of BTFO_(x=0.10) thin film is two orders lower than that of the pure BFO, i.e. 5.1 × 10~(-7) A/cm~2 at 100 kV/cm. Furthermore, the electrical conduction mechanism of the BTFO thin films is dominated by space-charge-limited conduction. The two-phase coexistence of BTFO_(x=0.10) gives rise to the superior ferroelectric (2P_r= 135.1 μC/cm~2) and the enhanced ferromagnetic properties (M_s=6.3 emu/cm~3). The optimal performance of the BTFO thin films is mainly attributed to the biphasic structure and the distorted deformation of FeO_6 octahedra.
机译:通过溶胶-凝胶旋涂法成功地在FTO(氟掺杂氧化锡)衬底上成功制备了纯BiFeO_3(BFO)和Bi_(1-x)Tb_xFeO_3(BTFO)薄膜。系统研究了Tb掺杂对BTFO薄膜的结构转变,漏电流以及介电和多铁性的影响。 XRD,Rietveld细化和拉曼光谱结果清楚地表明,在掺有Tb的情况下,结构从菱形(R3c:R)转变为双相结构(R3c:H + R-3m:R)。 BTFO_(x = 0.10)薄膜的泄漏电流密度比纯BFO的泄漏电流密度低两个数量级,即100 kV / cm时为5.1×10〜(-7)A / cm〜2。此外,BTFO薄膜的导电机理主要是受空间电荷限制的导电。 BTFO_(x = 0.10)两相共存产生了优越的铁电性能(2P_r = 135.1μC/ cm〜2)和增强的铁磁性能(M_s = 6.3 emu / cm〜3)。 BTFO薄膜的最佳性能主要归因于FeO_6八面体的双相结构和畸变变形。

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