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Multiferroic properties of Dy modified BiFeO_3 thin films in comparison with Tb modified BiFeO_3 thin films

机译:Dy改性的BiFeO_3薄膜与Tb改性的BiFeO_3薄膜的多铁性

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摘要

Coexistence of ferroelectric and ferromagnetic order parameters was observed at room temperature in Bi_(0.6)Dy_(0.3)La_(0.1)FeO_3 thin films grown on Pt/TiO_2/SiO_2/Si substrates using a pulsed laser deposition technique similar to that for Bi_(0.6)Tb_(0.3)La_(0.1)FeO_3. The coexistence of ferroelectric and magnetic domains in specific spatial area of the thin film was also confirmed by scanning probe imaging. As expected, the magnetization values obtained for Bi_(0.6)Dy_(0.3)La_(0.1)FeO_3 bulk and thin films were higher than those of Bi_(0.6)Tb_(0.3)La_(0.1)FeO_3 bulk and polycrystalline thin films because the magnetic moment of Dy is higher than that of Tb. However, preferentially oriented thin films of Bi_(0.6)Tb_(0.3)La_(0.1)FeO_3 exhibit much higher magnetization values. It is speculated that structural alignment caused by stress developed during deposition of these films could be responsible for enhancement in magnetization.
机译:使用类似于Bi_()的脉冲激光沉积技术,在室温下在Pt / TiO_2 / SiO_2 / Si衬底上生长的Bi_(0.6)Dy_(0.3)La_(0.1)FeO_3薄膜中观察到铁电和铁磁有序参数的共存。 0.6)Tb_(0.3)La_(0.1)FeO_3。通过扫描探针成像还证实了在薄膜的特定空间区域中铁电畴和磁畴的共存。不出所料,Bi_(0.6)Dy_(0.3)La_(0.1)FeO_3块状和薄膜的磁化值高于Bi_(0.6)Tb_(0.3)La_(0.1)FeO_3块状和多晶薄膜的磁化值。 Dy的磁矩高于Tb。但是,Bi_(0.6)Tb_(0.3)La_(0.1)FeO_3的优先取向薄膜表现出高得多的磁化值。据推测,由这些膜的沉积过程中产生的应力引起的结构排列可能是磁化强度提高的原因。

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