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Short-pulse high-intensity excimer lasers — A powerful tool for the generation of coherent VUV and XUV radiation

机译:短脉冲高强度准分子激光器 — 产生相干 VUV 和 XUV 辐射的强大工具

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Different approaches for the generation of coherent VUV and XUV radiation with a 400 fs KrF excimer-laser system are studied. In nonlinear optical experiments it is shown that four-wave difference-frequency mixing in Xe, using a near two-photon resonance with the KrF laser radiation, is well suited for the generation of tunable VUV radiation in the range 130–200 nm. Conversion efficiencies of 2 and output energies up to 260 μJ have been demonstrated. Further prospects to achieve μJ energies are discussed. Using this VUV source and the KrF laser, powerful XUV radiation can be generated by different low-order frequency mixing processes. In first experiments on this subject, direct frequency tripling of the KrF laser pulse has resulted in 14 μJ XUV radiation at 8
机译:研究了使用 400 fs KrF 准分子激光系统产生相干 VUV 和 XUV 辐射的不同方法。在非线性光学实验中,研究表明,Xe中的四波差频混合,使用与KrF激光辐射的近双光子共振,非常适合产生130-200 nm范围内的可调VUV辐射。已经证明了 2% 的转换效率和高达 260 μJ 的输出能量。讨论了实现μJ能量的进一步前景。使用这种 VUV 源和 KrF 激光器,可以通过不同的低阶频率混频过程产生强大的 XUV 辐射。在关于该主题的第一次实验中,KrF 激光脉冲的直接频率三倍导致 14 μJ XUV 辐射在 8

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