首页> 外文期刊>Russian Journal of Inorganic Chemistry >Reactions of Rhodium and Iridium Chloride and Chlorostannate Complexes with N-(2,6-Dimethyl-4-Methylenetriphenylphosphonium Chloride)phenyl-N-Propylthiourea Groups Covalently Grafted to the Silica Surface
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Reactions of Rhodium and Iridium Chloride and Chlorostannate Complexes with N-(2,6-Dimethyl-4-Methylenetriphenylphosphonium Chloride)phenyl-N-Propylthiourea Groups Covalently Grafted to the Silica Surface

机译:氯化铑和铱和氯锡酸盐配合物与共价接枝到二氧化硅表面的N-(2,6-二甲基-4-亚甲基三苯基phosph氯化物)苯基-N-丙基硫脲基团的反应

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摘要

Characteristic features of the interaction of iridium and rhodium chloride and chlorostannate complexes with N-(2,6-dimethyl-4-methylenetriphenylphosphonium chloride)phenyl-A7'-propylthiourea groups covalently fixed on the silica gel surface were studied. Comparison of the sorption isolation of rhodium and iridium by silicas with N-(2,6-dimethyl-4-methylenetriphenylphosphonium chloride)phenyl-N-propylthiourea and N-allyl-n-propylthiourea groups has shown that, at room temperature, the reaction proceeds by an anion exchange mechanism. At higher temperatures or during storage, rearrangement takes place on the sorbent surface, resulting in the migration of the metal ion from the anion exchange group to be coordinated to the sulfur atom of the thiourea fragment.
机译:研究了铱,铑氯化物和氯锡酸盐配合物与共价固定在硅胶表面上的N-(2,6-二甲基-4-亚甲基三苯基chloride氯化物)苯基-A7'-丙基硫脲基团相互作用的特征。二氧化硅与N-(2,6-二甲基-4-亚甲基三苯基氯化chloride)苯基-N-丙基硫脲和N-烯丙基-正丙基硫脲基团对铑和铱的吸附分离比较表明,在室温下,反应通过阴离子交换机制进行。在较高的温度下或在储存过程中,吸附剂表面会发生重排,导致金属离子从阴离子交换基团迁移到硫脲片段的硫原子上。

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