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Synthesis of Bi-O- and Bi-V-O-containing Nanolayers by Ionic Deposition

机译:离子沉积法合成含Bi-O-和Bi-V-O的纳米层

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摘要

A possibility of preparing Bi_2o_3 and BiVO_4 nanolayers by ionic deposition on the silica surface was shown for the first time. The influence of the concentration of pH of reactant solutions and of the number of ionic deposition cycles on the kinetics of the nanolayer growth was studied. The conditions were determined for the formation of a nanolayer by a reaction in a layer of ions sorbed on the surface. The thickness of the synthesized layers was determined by ellipsometry. The layer compositions were studied by X-ray spectral micoranalysis, X-ray photoelectron spectroscopy, and UV and IR Fourier transform spectroscopy. The structure of the layers was studied by powder X-ray diffraction.
机译:首次显示了通过在二氧化硅表面进行离子沉积制备Bi_2o_3和BiVO_4纳米层的可能性。研究了反应物溶液的pH浓度和离子沉积循环次数对纳米层生长动力学的影响。通过在表面吸附的离子层中的反应来确定形成纳米层的条件。合成层的厚度通过椭圆偏振法测定。通过X射线光谱显微分析,X射线光电子能谱以及UV和IR傅里叶变换光谱来研究层组成。通过粉末X射线衍射研究了层的结构。

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