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Effects of annealing on the luminescent properties from defects formed in electron-irradiated GaN

机译:退火对电子辐照GaN中形成的缺陷的发光特性的影响

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摘要

The effects of annealing on the luminescence properties of electron-irradiated GaN were investigated by photoluminescence (PL), scanning electron microscopy (SEM) and X-ray photoelectron spectroscopy (XPS). Our results indicate that the yellow luminescence (YL) remains disappear after all annealing treatments and shows a non-linear dependence on the annealing temperature up to 800 °C. The annealing process can be divided into two main stages associated with irradiation defects. At annealing temperatures up to 600 °C, the behavior of YL can be attributed to the net effects of V _(Ga)O _N complex formation caused by the migration of gallium vacancies (V _(Ga)) and V _(Ga)O _N complex dissociation due to the disappearance of gallium vacancies. At annealing temperatures approaching 800 °C, the incorporation of carbon into the group-V sublattice becomes the dominant factor in the appearance of YL. In addition, experimental results of PL and SEM show that a small proportion of irradiation damage still exists in GaN after annealing at 800 °C.
机译:通过光致发光(PL),扫描电子显微镜(SEM)和X射线光电子能谱(XPS)研究了退火对电子辐照GaN发光特性的影响。我们的结果表明,在所有退火处理之后,黄色发光(YL)仍然消失,并且对高达800°C的退火温度显示出非线性依赖性。退火过程可以分为与辐照缺陷相关的两个主要阶段。在高达600°C的退火温度下,YL的行为可归因于镓空位(V _(Ga))和V _(Ga)迁移引起的V _(Ga)O _N络合物形成的净效应由于镓空位的消失,O N复合物解离。在接近800°C的退火温度下,碳进入V组亚晶格成为YL外观的主要因素。此外,PL和SEM的实验结果表明,在800°C退火后,GaN中仍然存在少量的辐射损伤。

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