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首页> 外文期刊>Radiation Physics and Chemistry >Effect of swift heavy ion irradiation on structural and opto-electrical properties of bi-layer CdS-Bi2S3 thin films prepared by solution growth technique at room temperature
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Effect of swift heavy ion irradiation on structural and opto-electrical properties of bi-layer CdS-Bi2S3 thin films prepared by solution growth technique at room temperature

机译:快速重离子辐照对室温下溶液生长技术制备的双层CdS-Bi2S3薄膜结构和光电性能的影响

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CdS-Bi2S3 bi-layer thin films have been deposited by chemical bath deposition method on Indium Tin Oxide glass substrate at room temperature. The as-deposited thin films were annealed at 250 °C in an air atmosphere for 1 h. An air annealed thin film was irradiated using Au~(9+) ions with the energy of 120 MeV at fluence 5 × 10~(12) ions/cm~2 using tandem pelletron accelerator. The irradiation induced modifications were studied using X-ray diffraction (XRD), Atomic Force Microscopy (AFM), Raman spectroscopy, UV spectroscopy and I-V characteristics. XRD study reveals that the as-deposited thin films were nanocrystalline in nature. The decrease in crystallite size, increase in energy band gap and resistivity were observed after irradiation. Results are explained on the basis of energy deposited by the electronic loss after irradiation. The comparative results of as-deposited, air annealed and irradiated CdS-Bi2S3 bi-layer thin films are presented.
机译:在室温下,通过化学浴沉积法在氧化铟锡玻璃基板上沉积了CdS-Bi2S3双层薄膜。将沉积的薄膜在空气气氛中于250°C退火1小时。使用串联压片加速器以5×10〜(12)离子/ cm〜2的通量,能量为120 MeV的Au〜(9+)离子辐照空气退火的薄膜。使用X射线衍射(XRD),原子力显微镜(AFM),拉曼光谱,UV光谱和I-V特性研究了辐照引起的修饰。 XRD研究表明,沉积的薄膜本质上是纳米晶体。辐照后观察到微晶尺寸减小,能带隙增大和电阻率增大。根据辐照后电子损耗所沉积的能量来解释结果。给出了沉积,空气退火和辐照的CdS-Bi2S3双层薄膜的比较结果。

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