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Hydrogen-impurity complexes in III-V semiconductors

机译:III-V半导体中的氢杂质络合物

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This review summarizes the presently available knowledge concerning hydrogen-impurity complexes in III-V compounds. The impurities form shallow acceptors on group III sites (Be, Zn, Cd) and on group V sites (C, Si. Ge) as well as shallow donors on group V sites (S, Se, Te) and on group III sites (Si, Sn). These complexes are mainly revealed by their hydrogen stretching modes. Therefore, nearly all information about their structure and dynamic properties is derived from vibrational spectroscopy. The complexes of shallow impurities with hydrogen have been most extensively investigated in GaAs. GaP and InP. This holds also for Mg-H in GaN. The complexes exhibit a different microscopic structure, which is discussed in detail. The isoelectronic impurity nitrogen, complexed with one hydrogen atoms investigated in detail in GaAs and GaP. Those complexes can exist in different charge states. The experimental results such as vibrational frequencies. the microscopic structure and the activation energy for reorientation for many of these complexes are in very good agreement with results of ab initio calculations. Different types of oxygen-hydrogen complexes in GaAs, and GaP are described, with one hydrogen atom or two hydrogen atoms bonded to oxygen. Three of these complexes in GaAs were found to be electrically active.
机译:这篇综述总结了有关III-V化合物中氢杂质配合物的现有知识。杂质在III组位点(Be,Zn,Cd)和V组位点(C,Si。Ge)上形成浅受体,在V组位点(S,Se,Te)和III组位点(S,Se,Te)上形成浅施主。 Si,Sn)。这些配合物主要通过其氢拉伸模式揭示。因此,几乎所有有关其结构和动态特性的信息都来自振动光谱。在GaAs中,浅层杂质与氢的络合物得到了最广泛的研究。 GaP和InP。 GaN中的Mg-H也是如此。配合物表现出不同的微观结构,对此进行了详细讨论。在GaAs和GaP中详细研究了与一个氢原子络合的等电子杂质氮。这些络合物可以不同的电荷状态存在。实验结果如振动频率。许多复合物的微观结构和重新取向的活化能与从头算的结果非常吻合。描述了GaAs和GaP中不同类型的氧-氢络合物,其中一个氢原子或两个氢原子键合到氧上。发现在砷化镓中这些复合物中的三个具有电活性。

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