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Intersubband quantum-box semiconductor lasers: High-power, efficient CW sources for the 3-10-mu m wavelength range

机译:子带间量子盒半导体激光器:适用于3-10-μm波长范围的高功率,高效CW源

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摘要

Intersubband quantum-box (IQB) lasers, that is, devices consisting of 2D arrays of single-stage intersubband QB emitters, are proposed as an alternative to the 30-40-stage (conventional) quantum-cascade (QC) devices as sources for efficient room-temperature (RT) emission in the mid- and far-IR (3-5 mu m and 8-12 mu m) wavelength ranges. The devices rely on the much larger electron relaxation times in unipolar QBs than in quantum-well structures (i.e., the phonon bottleneck effect) to achieve low RT threshold-current densities (< 0.5 kA/cm(2)) and high RT CW wallplug efficiencies of 20-25%. Preliminary experimental results include the following: (i) The realization of the first mid-IR (lambda = 4.7 mu m) single-stage emitters operating at room temperature. These involve GaAs-based deep-well devices that, due to tight carrier confinement to the active QWs, do not need Bragg mirror/transmitter regions; (ii) etching and regrowth at the nanoscale level by employing in situ gas etching and regrowth in an MOCVD crystal-growth system; (iii) a pattern employing a high-resolution e-beam resist of 30-nm-diameter dots on 80-nm centers, and the transfer of the pattern into SiO2, thus forming a mask for the fabrication of IQBs via in situ etching and regrowth.
机译:提出将子带间量子盒(IQB)激光器(即由单级子带间QB发射器的2D阵列组成的设备)替代30-40级(常规)量子级联(QC)器件作为光源的替代方案在中红外和远红外(3-5微米和8-12微米)波长范围内进行高效的室温(RT)发射。该器件依靠单极性QB中的电子弛豫时间远大于量子阱结构中的电子弛豫时间(即,声子瓶颈效应)来实现低RT阈值电流密度(<0.5 kA / cm(2))和高RT CW壁塞效率为20-25%。初步的实验结果如下:(i)实现了在室温下工作的第一个中红外(λ= 4.7μm)单级发射器。这些涉及基于GaAs的深阱器件,由于将载流子严格限制在有源QW中,因此不需要布拉格镜/发射器区域。 (ii)通过在MOCVD晶体生长系统中采用原位气体蚀刻和再生来在纳米级进行蚀刻和再生; (iii)使用在80-nm中心直径为30-nm的点的高分辨率电子束抗蚀剂的图案,并将图案转移到SiO2中,从而形成用于通过原位蚀刻和制备IQB的掩模再生

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