THIN-FILM METROLOGY: Ellipsometry provides detailed analysis of infrared optical thin films

摘要

Modern IR-spectroscopic ellipsometry instruments and data analysis software provide accurate and repeatable thickness and optical property measurements of substrates and film samples. As the number of applications for infrared optics grows, so does the need for accurate measurement of the infrared (IR) optical properties of the materials that are used to fabricate lenses, mirrors, and other optical components. Modern IR-spectroscopic ellipsometry (SE) instruments and associated data analysis software can provide highly accurate and repeat-able thickness and optical property measurements of substrates, as well as single and multilayer film samples, over the spectral range from 1.7 to 33 (mu)m (300-5000 cm~(-1)).