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Measurement of the electron drift velocity in InSb up to fields of 800 V/cm in the presence of impact ionization

机译:在存在冲击电离的情况下,测量 InSb 中的电子漂移速度,最高可达 800 V/cm

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AbstractThe results of experimental investigation of the electron drift velocity (DV) as a function or electric field are presented for n‐InSb as determined from the measurements of the average microf wave (MW) conductivity at 77 K. In the samples studied an exponential growth of carrieconcentration in time due to impact ionization by the MW field is suppressed by fast recombination, the rate of which increased with the MW field. To find the nonequilibrium carrier concentration the MW field is switched off for a time interval short compared to the lifetime of excess carriers. The maximum DV as determined by this technique is 5.5 × 107cm/s and the threshold field for the appearance of negative differential mobility (NDM) is in the range 500 to 580 V/cm. From the analysis of the experimental data it is concluded that up to fields of 800 V/cm the ionization frequency is much smaller than the phonon scattering frequen
机译:摘要根据77 K时的平均微波(MW)电导率测量结果,对n-InSb的电子漂移速度(DV)作为函数或电场进行了实验研究。在所研究的样品中,由于MW场的冲击电离,携带浓度随时间呈指数增长,被快速复合抑制,其速率随着MW场的增加而增加。为了找到非平衡载流子浓度,与过量载流子的寿命相比,MW场被关闭一个较短的时间间隔。通过该技术确定的最大DV为5.5×107cm/s,出现负差分迁移率(NDM)的阈值场在500至580 V/cm的范围内。通过对实验数据的分析,可以得出结论,在高达800 V/cm的场中,电离频率远小于声子散射频率

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