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机译:
Univ Rovira & Virgili URV, ETSE DEEEA, Avda Paisos Catalans 26, Tarragona 43007, Spain;
Univ Saida, Dept Elect, Lab Modelizat & Calculat Methods, Saida 20000, Algeria;
Univ Mustapha Stambouli Mascara, Fac Sci & Technol, Dept Tech Sci ST, Lab Mat Applicat & Environm, Mascara 29000, Algeria;
I-V and C-V characteristics; Transconductance; AlxGa1-xN/GaN; HEMTs; Mole fraction; Threshold voltage; Numerical simulation; Atlas TCAD simulator;
机译:Al_xGa_(1-x)/ GaN HEMT中I-V和C-V特性的紧凑摩尔分数依赖性建模
机译:肖特基栅极AlGaN / GaN HEMT的正向I-V和C-V特性的异常行为
机译:AlGaN / GaN HEMT器件中基于物理的I-V和C-V特性的紧凑模型
机译:Al Mole分数对Alxga1-XN / GaN Hemts微波噪声性能的影响
机译:具有两个过渡AlxGa1-xN层的(111)硅上的GaN HEMT的应变分析
机译:栅极漏电流对alGaN / GaN HEmT的影响由低频噪声和脉冲电测量证明,栅极漏电流对alGaN / GaN HEmT的影响由脉冲I-V和低频噪声测量证明