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机译:
Department of Metallurgical Engineering, Yonsei University, Seoul 120-749, Korea;
Department of Applied Physics, Konkuk University, Chungju 380-701, Korea;
机译:Field emission conduction mechanisms in chemical vapor deposited diamond and diamondlike carbon films
机译:Hopping conduction in undoped lowhyphen;pressure chemically vapor deposited polycrystalline silicon films in relation to the film deposition conditions
机译:Comparison of the effect of boron and nitrogen incorporation on the nucleation behavior and electron-field-emission properties of chemical-vapor-deposited diamond films
机译:Thermal crystallization kinetic and electrical properties of partly crystallized amorphous indium oxide thin films sputtering deposited in the presence or the absence of water vapor