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Thermal crystallization kinetic and electrical properties of partly crystallized amorphous indium oxide thin films sputtering deposited in the presence or the absence of water vapor

机译：Thermal crystallization kinetic and electrical properties of partly crystallized amorphous indium oxide thin films sputtering deposited in the presence or the absence of water vapor

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5，8

机译：5，8

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Wang Meihan; Lei Hao; Seki Yoshiyuki; Seki Shigeyuki; Sawada Yutaka; Hoshi Yoichi; Wang Shaohong; Sun Lixian;
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1. Ultra-thin Oxide Films on SiO2: An STM Study of Their Thermal Stability in the Presence of Au Deposit [J] . 高等学校化学研究（英文版） . 2002,第002期
2. Thermal crystallization kinetic and electrical properties of partly crystallized amorphous indium oxide thin films sputtering deposited in the presence or the absence of water vapor [J] . Wang M., Lei H., Seki Y., Journal of thermal analysis and calorimetry . 2013,第2期

机译：在有或没有水蒸气的条件下沉积的部分结晶非晶氧化铟薄膜的热结晶动力学和电学性质
3. Thermal crystallization kinetics and crystallite size distribution of amorphous ITO film deposited in the presence or absence of water vapor [J] . Meihan Wang, Yutaka Sawada, Hao Lei, Thin Solid Films . 2010,第11期

机译：在有水蒸气存在或不存在的情况下沉积的非晶ITO膜的热结晶动力学和晶粒尺寸分布
4. Thermal change of amorphous indium tin oxide films sputter-deposited in water vapor atmosphere [J] . M.H. Wang, Y. Onai, Y. Hoshi, Thin Solid Films . 2008,第17期

机译：水蒸气气氛中溅射沉积的非晶铟锡氧化物薄膜的热变化
5. Microscopic structure and electrical transport property of sputter-deposited amorphous indium-gallium-zinc oxide semiconductor films [C] . H Yabuta, N Kaji, M Shimada, Symposium on Plasma Sciences for Materials . 2014

机译：溅射沉积非晶铟 - 氧化锌半导体膜的微观结构和电气传输性能
6. Crystallization kinetics of amorphous tin-doped indium oxide thin films. [D] . Ow-Yang, Cleva Wan. 1998

机译：非晶锡掺杂氧化铟薄膜的结晶动力学。
7. Magnetism of Amorphous and Nano-Crystallized Dc-Sputter-Deposited MgO Thin Films [O] . Sreekanth K. Mahadeva, Jincheng Fan, Anis Biswas, 2013

机译：非晶态和纳米晶化的Dc溅射沉积MgO薄膜的磁性
8. Influence of indium and hydrogen co-doping on optical and electrical properties of zinc oxide thin films deposited by DC magnetron sputtering [O] . Nguyen Huu Truong, Tinh Van Nguyen, Tuan Anh Thanh Pham, 2019

机译：铟和氢共掺杂对DC磁控溅射沉积的氧化锌薄膜光学和电性能的影响
9. Crystallization of Sputter Deposited Amorphous Metal Thin Films [R] . Thomas, R. E., Perepezko, J. H., Wiley, J. D. 1985

机译：溅射沉积非晶金属薄膜的晶化

Thermal crystallization kinetic and electrical properties of partly crystallized amorphous indium oxide thin films sputtering deposited in the presence or the absence of water vapor

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