NIST NEWS-CRITICAL DATA DERIVED FOR INTEGRATED CIRCUIT MANUFACTURING

摘要

The next generation of microlithography tools under development utilizes deep-ultraviolet radiation at wavelengths near 157 nanometers.This is characteristic of molecular fluorine lasers and is refracted (focused) by special materials such as calcium fluoride and barium fluoride.However,the index of refraction varies rapidly with wavelength,requiring precise determination of the location of the lasers' actual spectral lines for the design of the very costly lens systems in the chip-making equipment.