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In situ observation of step-edge in-plane growth of graphene in a STEM

机译:在STEM中石墨烯的台阶式边缘平面内生长的原位观察

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It is extremely difficult to control the growth orientation of the graphene layer in comparison to Si or III-V semiconductors. Here we report a direct observation of graphene growth and domain boundary formation in a scanning transmission electron microscope, with residual hydrocarbon in the microscope chamber being used as the carbon source for in-plane graphene growth at the step-edge of bilayer graphene substrate. We show that the orientation of the growth is strongly influenced by the step-edge structure and areas grown from a reconstructed 5-7 edge are rotated by 30 degrees with respect to the mother layer. Furthermore, single heteroatoms like Si may act as catalytic active sites for the step-edge growth. The findings provide an insight into the mechanism of graphene growth and defect reconstruction that can be used to tailor carbon nanostructures with desired properties.RI Suenaga, Kazu/E-2339-2014OI Suenaga, Kazu/0000-0002-6107-1123
机译:与Si或III-V半导体相比,极其难以控制石墨烯层的生长取向。在这里,我们报告了在扫描透射电子显微镜中对石墨烯生长和畴边界形成的直接观察,其中显微镜腔中的残留碳氢化合物被用作双层石墨烯基底台阶边缘的平面内石墨烯生长的碳源。我们显示出生长的方向受台阶边缘结构的强烈影响,并且从重构的5-7边缘生长的区域相对于母层旋转了30度。此外,像Si这样的杂原子也可以作为台阶边缘生长的催化活性位。这些发现为石墨烯生长和缺陷重建的机理提供了见解,可用于定制具有所需性能的碳纳米结构.RI Suenaga,Kazu / E-2339-2014OI Suenaga,Kazu / 0000-0002-6107-1123

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