IN-SITU OBSERVATION DEVICE OF SUBSTRATE WARPAGE AND CRYSTAL GROWTH APPARATUS

摘要

[Problem] To provide a device which is capable of in-situ observation of warpage behavior of a crystal growth substrate, and a crystal growth apparatus. [Solution] This device includes at least a substrate, a light source that emits a laser light, and a light reception unit that receives the laser light. Warpage of the substrate is observed in-situ by the laser light emitted from the light source being reflected off of a reflective surface which is the back surface of the substrate, and the reflected light being received at the light reception unit. The laser light is two parallel separated lights separated before entering the reflective surface. The reflection from the back surface generates an optical path difference between the separated lights and the warpage is observed in-situ by this optical path difference. Further, this device is provided on the crystal growth apparatus in which crystal is grown on a crystal growth surface of the substrate.