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Water-Repellency Enhancement of Nanostructured Plasma-Polymerized HMDSO Coatings Using Grey-Based Taguchi Method

机译:灰色的Taguchi方法增强纳米结构的等离子聚合HMDSO涂层的憎水性

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摘要

This paper presents results showing the improvement of water repellency on an aluminium substrate after immersion in boiling water followed by plasma polymerization of Hexamethyldisiloxane (HMDSO) via a Grey-based Taguchi method. Immersion in boiling water was used to create a rough nanostructured surface on the aluminium alloy substrate; surface roughness was investigated by SEM and AFM analyses. The water-repellent characteristics on the rough surface were obtained by plasma polymerization of HMDSO. In order to optimize the plasma polymerization, four controlling parameters of the plasma process namely input power, deposition time, monomer flow, and distance from monomer inlet were considered. The Taguchi approach followed by Grey relational analysis was applied to solve this multi-response optimization problem (high contact angle and low contact angle hysteresis). Through the Grey-based Taguchi method, it was found that distance between the monomer inlet and substrate plays the most significant role in affecting the coating wettability. The optimal condition proposed by this method has been verified through additional experiments which showed an increase in static contact angle up to 163 deg and a decrease in contact angle hysteresis up to 13 deg.
机译:本文提出的结果表明,浸入沸水中,然后通过基于灰色的Taguchi方法进行六甲基二硅氧烷(HMDSO)的等离子聚合后,铝基板上的疏水性得到了改善。使用浸入沸腾的水在铝合金基底上形成粗糙的纳米结构表面。通过SEM和AFM分析研究了表面粗糙度。通过HMDSO的等离子体聚合获得粗糙表面上的疏水特性。为了优化等离子体聚合,考虑了等离子体工艺的四个控制参数,即输入功率,沉积时间,单体流量和距单体入口的距离。采用Taguchi方法,然后进行灰色关联分析,以解决此多响应优化问题(高接触角和低接触角滞后)。通过基于灰色的Taguchi方法,发现单体入口和基材之间的距离在影响涂层润湿性方面起着最重要的作用。此方法提出的最佳条件已通过其他实验验证,这些实验显示静态接触角增加到163度,而接触角磁滞减少到13度。

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