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Large-scale chemical assembly of atomically thin transistors and circuits

机译:原子薄晶体管和电路的大规模化学组装

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Next-generation electronics calls for new materials beyond silicon, aiming at increased functionality, performance and scaling in integrated circuits. In this respect, two-dimensional gapless graphene and semiconducting transition-metal dichalcogenides have emerged as promising candidates due to their atomic thickness and chemical stability. However, difficulties with precise spatial control during their assembly currently impede actual integration into devices. Here, we report on the large-scale, spatially controlled synthesis of heterostructures made of single-layer semiconducting molybdenum disulfide contacting conductive graphene. Transmission electron microscopy studies reveal that the single-layer molybdenum disulfide nucleates at the graphene edges. We demonstrate that such chemically assembled atomic transistors exhibit high transconductance (10 mu S), on-off ratio (similar to 10(6)) and mobility (similar to 17 cm(2) V-1 s(-1)). The precise site selectivity from atomically thin conducting and semiconducting crystals enables us to exploit these heterostructures to assemble two-dimensional logic circuits, such as an NMOS inverter with high voltage gain (up to 70).
机译:下一代电子产品要求硅以外的新材料,旨在提高集成电路的功能,性能和规模。在这方面,由于其原子厚度和化学稳定性,二维无间隙石墨烯和半导体过渡金属二卤化物已成为有希望的候选物。然而,在组装期间精确空间控制的困难目前阻碍了实际集成到设备中。在这里,我们报道了由单层半导体二硫化钼接触导电石墨烯制成的异质结构的大规模空间控制合成。透射电子显微镜研究表明,单层二硫化钼在石墨烯边缘成核。我们证明这种化学组装的原子晶体管表现出高跨导(10μS),开-关比(类似于10(6))和迁移率(类似于17 cm(2)V-1 s(-1))。对原子薄的导电和半导电晶体的精确位点选择性使我们能够利用这些异质结构来组装二维逻辑电路,例如具有高电压增益(高达70)的NMOS反相器。

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