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Nanostructures and optical characteristics of ZnO thin-film-like samples grown on GaN

机译:在GaN上生长的ZnO薄膜状样品的纳米结构和光学特性

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摘要

We compared the nano-structures of three samples of ZnO thin films grown on GaN with different growth temperature conditions. Although disconnected spiral domain structures (of the order of 100 nm in width) were observed in the samples of high-temperature growth, their crystal qualities are generally better than the one grown at low temperature, either near the GaN interface or far away from the interface. In the sample of high-temperature growth through the whole process, the domain structures extend from the interface with a smaller scale and almost vertical sharp boundaries. The sample grown at the low temperature showed a generally continuous structure from the interface. However, its crystal quality is quite poor. In the sample with initial low-temperature growth and then high-temperature growth, the ZnO layer started with a continuous structure, like the sample of low-temperature growth. However, it evolved into domain structures similar to the sample of high-temperature growth beyond about 200 nm in thickness. The samples of high-temperature growth generally have higher photon emission efficiencies. The sample grown at the high temperature through the whole growth process has the highest emission quantum efficiency.
机译:我们比较了三种在不同生长温度条件下在GaN上生长的ZnO薄膜样品的纳米结构。尽管在高温生长的样品中观察到不连续的螺旋畴结构(宽度为100 nm的数量级),但它们的晶体质量通常都好于在GaN界面附近或远离GaN界面的低温生长。接口。在整个过程中高温生长的样品中,畴结构从界面延伸,并具有较小的尺度和几乎垂直的尖锐边界。在低温下生长的样品从界面显示出大体连续的结构。但是,其晶体质量相当差。在最初具有低温生长然后具有高温生长的样品中,ZnO层开始具有连续结构,就像低温生长的样品一样。但是,它演变成类似于高温生长样品的畴结构,厚度超过200 nm。高温生长的样品通常具有较高的光子发射效率。在整个生长过程中高温生长的样品具有最高的发射量子效率。

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