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Band gap modification of single-walled carbon nanotube and boron nitride nanotube under a transverse electric field

机译:电场作用下单壁碳纳米管和氮化硼纳米管的带隙修饰

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摘要

The electronic structures of carbon (C) and boron nitride (BN) nanotubes under a transverse electric field were investigated through the first-principles pseudopotential density-functional theory (DFT) calculations. It was found that band gap modifications occur both in the semiconducting C and BN nanotubes under an external electric field by inducing a semiconductor-metal transition. The variations of the band gap sizes with transverse electric fields are very different between C and BN nanotubes. In the semiconducting C nanotube, a sharp semiconductor-metal transition does not occur until a threshold electric field is achieved; the BN nanotube. on the other hand, shows a gradual reduction of the band gap size once an external electric field is applied due to the larger ionicity of BN bonds. In addition, the semiconductor-metal transition in both C and BN nanotubes occurs at a lower value of electric field with increasing diameter. The ability to tune the band gap in both C and BN nanotubes by an external electric field provides the possibility for future electronic and electro-optic nanodevice applications.
机译:通过第一性原理pseudo势密度泛函理论(DFT)计算研究了碳(C)和氮化硼(BN)纳米管在横向电场下的电子结构。发现通过诱导半导体-金属跃迁,在外部电场下,半导体C和BN纳米管中均发生带隙修饰。带隙尺寸随横向电场的变化在C和BN纳米管之间非常不同。在半导体碳纳米管中,直到达到阈值电场,才会发生急剧的半导体-金属跃迁; BN纳米管。另一方面,由于BN键的较大的离子性,一旦施加外部电场,则表明带隙尺寸逐渐减小。另外,随着直径的增大,C和BN纳米管中的半导体-金属跃迁都在较低的电场值下发生。通过外部电场调节C和BN纳米管中的带隙的能力为未来的电子和电光纳米器件应用提供了可能性。

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