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Structure and defect characterization of multiferroic ReMnO3 films and multilayers by TEM

机译:TEM表征多铁性ReMnO3薄膜和多层膜的结构和缺陷

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摘要

Epitaxial rare earth manganite thin films (ReMnO3; Re = Tb, Ho, Er, and Y) and multilayers were grown by liquid injection metal organic chemical vapor deposition (MOCVD) on YSZ(111) and the same systems were grown c-oriented on Pt(111) buffered Si substrates. They have been structurally investigated by electron diffraction (ED) and high resolution transmission electron microscopy (HRTEM). Nanodomains of secondary orientation are observed in the hexagonal YMnO3 films. They are related to a YSZ(111) and Pt(111) misorientation. The epitaxial film thickness has an influence on the defect formation. TbO2 and Er2O3 inclusions are observed in the TbMnO3 and ErMnO3 films respectively. The structure and orientation of these inclusions are correlated to the resembling symmetry and structure of film and substrate. The type of defect formed in the YMnO3/HoMnO3 and YMnO3/ErMnO3 multilayers is also influenced by the type of substrate they are grown on. In our work, atomic growth models for the interface between the film/substrate are proposed and verified by comparison with observed and computer simulated images.
机译:外延稀土锰锰薄膜(ReMnO3; Re = Tb,Ho,Er和Y)和多层膜通过在YSZ(111)上进行注液金属有机化学气相沉积(MOCVD)进行生长,并在c上以c取向生长相同的系统Pt(111)缓冲的Si衬底。通过电子衍射(ED)和高分辨率透射电子显微镜(HRTEM)对它们进行了结构研究。在六角形的YMnO3薄膜中观察到了二级取向的纳米域。它们与YSZ(111)和Pt(111)取向错误有关。外延膜的厚度对缺陷形成有影响。在TbMnO3和ErMnO3薄膜中分别观察到TbO2和Er2O3夹杂物。这些夹杂物的结构和取向与膜和基底的相似对称性和结构相关。 YMnO3 / HoMnO3和YMnO3 / ErMnO3多层中形成的缺陷类型也受其上生长的衬底类型的影响。在我们的工作中,提出了薄膜/基材之间界面的原子生长模型,并通过与观察到的图像和计算机模拟图像进行比较来验证了该模型。

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