Development of contact scanning probe lithography methods for the fabrication of lateral nano-dimensional elements

摘要

A method of contact scanning probe lithography has been developed to enable fabrication of elements with characteristic dimensions of about 50 nm. The method involves deposition of a thin-film two-layer polymer-metal mask coating, mechanical or thermal nonplastic deformation of the top metal layer with a probe microscope, the transfer of the pattern through the polymer by means of dry etching and the formation of various nanoelements through this prepared mask. The method is applicable to any materials relevant to the formation of different nanometre objects-both metal and dielectric-on their surface.