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首页> 外文期刊>Nanotechnology >The effect of DC biasing of Si substrates on the structure and grain size of Pb_(1-x)Fe_xS nanoparticle films
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The effect of DC biasing of Si substrates on the structure and grain size of Pb_(1-x)Fe_xS nanoparticle films

机译:硅衬底的直流偏置对Pb_(1-x)Fe_xS纳米颗粒膜结构和晶粒尺寸的影响

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摘要

Pb_(1-x)Fe_xS nanoparticle films were grown on silicon substrates under zero, positive and negative biasing by the chemical bath deposition technique. The grain size for films with a fixed x was observed to increase with positive biasing and decrease with negative biasing of the substrates. Distortion of the lattice is observed to increase and the average grain size decreases as the substrate bias is changed from positive through zero to negative values. The DC conductivity of the films decreases with decrease in grain size due to enhanced surface scattering. The nanoparticle films are semiconducting and show a predominance of variable range hopping of the carriers among localized states.
机译:通过化学浴沉积技术,Pb_(1-x)Fe_xS纳米颗粒薄膜在零,正和负偏压下在硅基板上生长。观察到具有固定x的薄膜的晶粒尺寸随着基材的正偏压而增加,而随着基材的负偏压而减小。随着衬底偏压从正值从零变为负值,观察到晶格畸变增加,平均晶粒尺寸减小。由于增强的表面散射,薄膜的直流电导率随着晶粒尺寸的减小而降低。纳米颗粒薄膜是半导体,并且在局部状态中显示出载流子的可变范围跳跃占优势。

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