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Raman resonance in the strained Ge quantum dot array

机译:应变Ge量子点阵列中的拉曼共振

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We study the Raman resonance of a Ge quantum dot (QD) array grown pseudomorphically to a Si matrix using low-temperature molecular-beam epitaxy. A change of the resonance energy and the shape of the resonance curve in comparison with bulk Ge are observed. These features are shown to be explained by taking into account QD strain and the quasistationary character of the electronic states responsible for the observed resonance. Application of a model of the two-dimensional critical point of the interband density of states allows us to estimate the damping parameter and localization size of these states. It is shown that the observed enhancement of the resonance amplitude in a QD array as compared to the bulk case is related to transformation of the interband density of states into the d-function due to quantization of the electron-hole spectrum.
机译:我们研究了使用低温分子束外延法向硅基质拟态生长的Ge量子点(QD)阵列的拉曼共振。与块状Ge相比,观察到共振能量的变化和共振曲线的形状。通过考虑QD应变和负责观察到的共振的电子态的准静态特性,可以解释这些特征。状态间带间密度的二维临界点模型的应用使我们能够估计这些状态的阻尼参数和局部大小。结果表明,与整体情况相比,在QD阵列中观察到的共振幅度增强与由于电子空穴谱的量化导致的带间态态密度转换为d函数有关。

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