Narrow linewidth templates for nanoimprint lithography utilizing conformal deposition

摘要

Nanoimprint lithography has the potential to cost efficiently realize patterns with extremely narrow linewidth over a large area. A significant challenge to achieving this target is the fabrication of nanoimprint templates. The cost and writing time of conventional electron beam lithography for direct writing of the templates rapidly increases as the patterned area increases and the linewidth decreases. We have developed a novel process for creating narrow linewidth nanopatterns. This process is based on conformal deposition of thin films on seed nanopatterns. We have demonstrated the process by fabricating nanosized loops and lines. The linewidth of the structures can be tuned precisely, and in our experiments it could be reduced to 20 nm. The closed loop structures are interesting, since this geometry is crucially important in many leading edge research fields such as negative refractive index materials, ultrahigh density memory applications and quantum rings. The fabricated template was subsequently used as a template in soft-stamp UV nanoimprint lithography to successfully replicate the structures in UV-curable resist.