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首页> 外文期刊>Nanotechnology >The effects of chemical doping with F4TCNQ in carbon nanotube field-effect transistors studied by the transmission-line-model technique
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The effects of chemical doping with F4TCNQ in carbon nanotube field-effect transistors studied by the transmission-line-model technique

机译:通过传输线模型技术研究了F4TCNQ化学掺杂对碳纳米管场效应晶体管的影响

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摘要

We have studied the effects of p-type chemical doping with F_4TCNQ (tetrafluorotetracyano-p-quinodimethane) in carbon nanotube field-effect transistors (CNFETs). The transmission-line-model technique using multi-probe CNFETs has been employed to investigate the effects of chemical doping on the channel resistance and contact resistance. It has been found that chemical doping is effective in the reduction of the contact resistance as well as the channel resistance. The device performances of top-gate CNFETs such as transconductance, on-resistance, and on/off ratio were improved by the F_4TCNQ chemical doping on the access regions.
机译:我们已经研究了碳纳米管场效应晶体管(CNFET)中用F_4TCNQ(四氟四氰基-p-喹二甲烷)进行p型化学掺杂的影响。使用多探针CNFET的传输线模型技术已被用来研究化学掺杂对沟道电阻和接触电阻的影响。已经发现,化学掺杂在降低接触电阻以及沟道电阻方面是有效的。通过对访问区域进行F_4TCNQ化学掺杂,可以提高顶栅CNFET的器件性能,例如跨导,导通电阻和导通/截止比。

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