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Comparison of InAs quantum dots grown on GaInAsP and InP

机译:在GaInAsP和InP上生长的InAs量子点的比较

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摘要

We report on the growth of InAs quantum dots (QDs) on GaInAsP and InP buffers by metal - organic chemical vapour deposition on InP( 100) substrates. Indium segregation and the As - P exchange reaction affect the QD nucleation and composition. The As - P exchange reaction has a more pronounced effect on the QDs grown on the InP buffer than on those grown on the GaInAsP buffer. A very thin (0.6 nm) GaAs interlayer grown between the buffer layer and the InAs QD layer consumes segregated indium and minimizes the As/P exchange reaction. Wavelength tuning from 1450 to 1750 nm covering the technologically important 1550 nm wavelength is also achieved for the InAs QDs grown with the thin GaAs interlayer.
机译:我们报告了在InP(100)衬底上通过金属-有机化学气相沉积在GaInAsP和InP缓冲液上生长InAs量子点(QD)的情况。铟的偏析和As-P交换反应影响QD形核和组成。与在GaInAsP缓冲液上生长的QD相比,As-P交换反应对在InP缓冲液上生长的QD具有更显着的影响。在缓冲层和InAs QD层之间生长的非常薄(0.6 nm)的GaAs中间层会消耗分离的铟,并使As / P交换反应最小化。对于使用薄GaAs夹层生长的InAs量子点,还可以实现从1450 nm到1750 nm的波长调谐,涵盖了技术上重要的1550 nm波长。

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