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Mechanisms of molecular beam epitaxy growth in InAs/InP nanowire heterostructures

机译:InAs / InP纳米线异质结构中分子束外延生长的机理

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摘要

InAs/InP axial nanowire heterostructures were grown by the Au-assisted vapour-liquid-solid method in a gas source molecular beam epitaxy system. The nanowire crystal structure and morphology were investigated by transmission electron microscopy for various growth conditions (temperature, growth rate, V/III flux ratio). Growth mechanisms were inferred from the InAs and InP segment lengths as a function of the nanowire diameter. Short InAs segment lengths were found to grow by depletion of In from the Au particle as well as by direct impingement, while longer segments of InAs and InP grew by diffusive transport of adatoms from the nanowire sidewalls. The present study offers a way to control the lengths of InAs quantum dots embedded in InP barriers.
机译:在气体源分子束外延系统中,通过金辅助汽-液-固方法生长了InAs / InP轴向纳米线异质结构。通过透射电子显微镜研究了各种生长条件(温度,生长速率,V / III通量比)的纳米线晶体结构和形态。从InAs和InP片段的长度推断出生长机理是纳米线直径的函数。发现短的InAs片段长度是通过从Au颗粒中耗尽In以及通过直接撞击而增长的,而更长的InAs和InP片段是通过纳米线侧壁的原子扩散扩散而增长的。本研究提供了一种方法来控制InP势垒中嵌入的InAs量子点的长度。

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