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Low voltage nanoelectromechanical switches based on silicon carbide nanowires

机译:基于碳化硅纳米线的低压纳米机电开关

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摘要

We report experimental demonstrations of electrostatically actuated, contact-mode nanoelectromechanical switches based on very thin silicon carbide (SiC) nanowires (NWs). These NWs are lithographically patterned from a 50 nm thick SiC layer heteroepitaxially grown on single-crystal silicon (Si). Several generic designs of in-plane electrostatic SiC NW switches have been realized, with NW widths as small as ~20 nm and lateral switching gaps as narrow as ~10 nm. Very low switch-on voltages are obtained, from a few volts down to ~1 V level. Two-terminal, contact-mode hot switching with high on/off ratios (>10~2 or 10~3) has been demonstrated repeatedly for many devices. We find enhanced switching performance in bare SiC NWs, with lifetimes exceeding those based on metallized SiC NWs.
机译:我们报告基于非常细的碳化硅(SiC)纳米线(NWs)的静电驱动,接触模式纳米机电开关的实验演示。这些NW由在单晶硅(Si)上异质外延生长的50 nm厚SiC层光刻图案化。已经实现了几种平面内静电SiC NW开关的通用设计,其NW宽度小至20 nm,横向开关间隙窄至10 nm。获得了非常低的接通电压,从几伏降至1V。具有高导通/截止比(> 10〜2或10〜3)的两端子接触模式热切换已在许多设备中得到反复证明。我们发现裸露的SiC NW具有更高的开关性能,其使用寿命超过了金属化SiC NW的使用寿命。

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