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A dual-silicon-nanowires based U-shape nanoelectromechanical switch with low pull-in voltage

机译:具有低吸合电压的基于双硅纳米线的U型纳米机电开关

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摘要

A dual-silicon-nanowires based U-shape nanoelectromechanical switch with low pull-in voltage is fabricated using standard complementary metal-oxide-semiconductor compatible process on silicon-on-insulator wafer. The switch consists of a capacitive paddle with dimension of 2 μm by 4μm supported by two silicon nanowires, suspended on top of the substrate with a gap of 145 nm. The nanowires are 5 μm long with cross-section of 90 nm by 90 nm. The average pull-in voltage is about 1.12 V and the ratio of the ON/OFF current is measured to be over 10 000. According to the preliminary results, this U-shape structure demonstrates great potential in lowering down the pull-in voltage.
机译:在绝缘体上硅晶片上使用标准互补金属氧化物半导体兼容工艺制造了具有低吸合电压的基于双硅纳米线的U型纳米机电开关。该开关由尺寸为2μmx4μm的电容式桨叶组成,并由两条硅纳米线支撑,并以145 nm的间隙悬浮在基板的顶部。纳米线的长度为5μm,横截面为90 nm x 90 nm。平均吸合电压约为1.12 V,测得的ON / OFF电流之比超过10000。根据初步结果,这种U形结构显示出降低吸合电压的巨大潜力。

著录项

  • 来源
    《Applied Physics Letters》 |2012年第11期|p.113102.1-113102.3|共3页
  • 作者单位

    Department of Electrical and Computer Engineering, National University of Singapore,4 Engineering Drive 3, Singapore 117576,Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research),11 Science Park Road, Singapore Science Park II, Singapore 117685;

    Department of Electrical and Computer Engineering, National University of Singapore,4 Engineering Drive 3, Singapore 117576;

    Institute of Microelectronics, A*STAR (Agency for Science, Technology and Research),11 Science Park Road, Singapore Science Park II, Singapore 117685;

    Department of Electrical and Computer Engineering, National University of Singapore,4 Engineering Drive 3, Singapore 117576;

  • 收录信息 美国《科学引文索引》(SCI);美国《工程索引》(EI);美国《生物学医学文摘》(MEDLINE);
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类
  • 关键词

  • 入库时间 2022-08-18 03:17:08

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