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Aryl functionalization as a route to band gap engineering in single layer graphene devices

机译:芳基官能化作为单层石墨烯器件中带隙工程的途径

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摘要

Chemical functionalization is a promising route to band gap engineering of graphene. We chemically grafted nitrophenyl groups onto exfoliated single-layer graphene sheets in the form of substrate-supported or free-standing films. Our transport measurements demonstrate that nonsuspended functionalized graphene behaves as a granular metal, with variable range hopping transport and a mobility gap ~0.1 eV at low temperature. For suspended graphene that allows functionalization on both surfaces, we demonstrate tuning of its electronic properties from a granular metal to a semiconductor in which transport occurs via thermal activation over a transport gap ~80 meV from 4 to 300 K. This noninvasive and scalable functionalization technique paves the way for CMOS-compatible band gap engineering of graphene electronic devices.
机译:化学官能化是实现石墨烯带隙工程的有前途的途径。我们将硝基苯基基团支撑或自支撑膜的形式化学接枝到脱落的单层石墨烯片上。我们的传输测量结果表明,未悬浮的功能化石墨烯表现为颗粒状金属,在低温下具有可变的跳变传输范围和迁移率缺口〜0.1 eV。对于允许在两个表面上都进行功能化的悬浮石墨烯,我们演示了其电子性质从粒状金属到半导体的微调,在半导体中通过热活化在4至300 K的传输间隙〜80 meV上进行传输。这种无创且可扩展的功能化技术为石墨烯电子器件的CMOS兼容带隙工程铺平了道路。

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