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Screen-Printed Cu Source/Drain Electrodes for a-InGaZnO Thin-Film Transistors

机译:用于a-InGaZnO薄膜晶体管的丝网印刷铜源极/漏极电极

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摘要

We report screen-printed copper source/drain electrodes for a-InGaZnO (a-IGZO) thin-film transistors (TFTs). The best electrical characteristics of the a-IGZO TFTs were a field-effect mobility of 2.06 cm~2/Vs, a threshold voltage of'3.40 V, an on/off current ratio of 6.0×10~3 A/A, and a subthreshold swing of 7.02 V/decade. Resulting TFT performances indicate that blocking the inter-diffusion of Cu and impurities is a key factor to fabricate low leakage current and high performance a-IGZO TFTs with printed Cu SID electrodes.
机译:我们报告了用于a-InGaZnO(a-IGZO)薄膜晶体管(TFT)的丝网印刷铜源/漏电极。 a-IGZO TFT的最佳电特性是2.06 cm〜2 / Vs的场效应迁移率,3.40 V的阈值电压,6.0×10〜3 A / A的开/关电流比和阈值摆幅为7.02 V /十倍。所得的TFT性能表明,阻止Cu和杂质的相互扩散是制造带有印刷Cu SID电极的低泄漏电流和高性能a-IGZO TFT的关键因素。

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