A nanoscale linewidth/pitch standard for high-resolution optical microscopy and other microscopic techniques

摘要

We have developed a new lateral standard on the nanometre scale for use with the recently introduced high-resolution optical microscopy techniques such as deep ultraviolet microscopy (DUVM) and confocal laser scanning microscopy (CLSM). The standard provides structures in the submicron- and sub-100 nm scale, and meets the metrological requirements for accurate and traceable optical microscopy measurements. It can be used as a length measurement standard (for pitch and linewidth measurements) and for quick resolution and astigmatism testing of all these instruments. Additionally, circular gratings provide a new way for the calibration of scanning probe microscopes.