Development of a nanoscale linewidth-standard for high-resolution optical microscopy

摘要

We are developing a new linewidth standard on the nanometre scale for use in the recently introduced new high-resolution optical microscopy techniques like deep ultraviolet microscopy (UVM) and confocal laser scanning microscopy (CLSM). Different types of high-resolution gratings, etched in amorphous silicon on quartz substrates, have been fabricated and evaluated using state-of-the-art UVM, CLSM, REM and AFM equipment. The produced linewidths range from about 80 nm to 2 μm. The contrast of the pattern in the UV region makes them suitable for transmission and reflection UV and laser scanning microscopy.