首页> 外文期刊>Modern Physics Letters, B. Condensed Matter Physics, Statistical Physics, Applied Physics >Anomalous crossover from efros-shklovskii to mott variable range hopping in silicon mosfets
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Anomalous crossover from efros-shklovskii to mott variable range hopping in silicon mosfets

机译:从efros-shklovskii异常过渡到硅mosfet中的mott可变范围跳变

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In this paper, we investigate the temperature dependence of the electrical resistivity of a two-dimensional electron system in n-channel Si-MOSFETs at zero magnetic field down to 0.2 K. At low electron densities, near the metal-insulator transition point from the insulating side, our results show the existence of a crossover, from Efros-Shklovskii variable range hopping (ES-VRH), which is consistent with the existence of a Coulomb gap, where ρ = ρ_0exp(T_(ES)/T)~(1/2) to Mott regime, where ρ = ρ_0exp(T_M/T)~(1/3). With ρ_0 is a pre-exponential factor that is found to be close to 2 (h/e~2), this crossover occurs when T ~ 1 K.
机译:在本文中,我们研究了在零磁场下至0.2 K的n沟道Si-MOSFET中二维电子系统电阻率的温度依赖性。在绝缘方面,我们的结果表明存在从Efros-Shklovskii可变范围跳变(ES-VRH)开始的交叉,这与存在库仑间隙一致,其中ρ=ρ_0exp(T_(ES)/ T)〜( 1/2)到Mott体制,其中ρ=ρ_0exp(T_M / T)〜(1/3)。 ρ_0是一个预指数因子,发现它接近2(h / e〜2),当T〜1 K时发生这种交叉。

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