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首页> 外文期刊>Microscopy and microanalysis: The official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada >X-Ray Microanalysis Combined with Monte Carlo Simulation for the Analysis of Layered Thin Films: The Case of Carbon Contamination
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X-Ray Microanalysis Combined with Monte Carlo Simulation for the Analysis of Layered Thin Films: The Case of Carbon Contamination

机译:X射线微分析与蒙特卡洛模拟相结合用于层状薄膜的分析:碳污染的情况

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摘要

A previously developed Monte Carlo code has been extended to the X-ray microarialysis in a (scanning) transmission electron microscope of plan sections, consisting of bilayers and triple layers. To test the validity of this method for quantification purposes, a commercially available NiOx (x similar to 1) thin film, deposited on a carbon layer, has been chosen. The composition and thickness of the NiO film and the thickness of the C support layer are obtained by fitting to the three X-ray intensity ratios I(NiK)/I(OK), I(NiK)/I(CK), and I(OK)/I(CK). Moreover, it has been investigated to what extent the resulting film composition is affected by the presence of a contaminating carbon film at the sample Surface. To this end, the sample has been analyzed both in the (recommended) "grid downward" geometry and in the upside/down ("grid upward") Situation. It is found that a carbon contaminating film of few tens of nanometers must be assumed in both cases, in addition to the C support film. Consequently, assuming the proper C/NiOx/C stack in the simulations, the Monte Carlo method yields the correct oxygen concentration and thickness of the MID, film.
机译:在由双层和三层组成的平面截面的(扫描)透射电子显微镜中,先前开发的蒙特卡洛代码已扩展到X射线微分析。为了测试此方法用于定量的有效性,已选择了沉积在碳层上的市售NiOx(x类似于1)薄膜。通过使三个X射线强度比I(NiK)/ I(OK),I(NiK)/ I(CK)和I拟合来获得NiO膜的组成和厚度以及C支撑层的厚度(确定)/ I(CK)。此外,已经研究了在样品表面上污染碳膜的存在对所得膜组成的影响程度。为此,已经在(推荐的)“向下栅格”几何形状和在向上/向下(“向上栅格”)情况下分析了样品。已经发现,在两种情况下,除了C载体膜之外,还必须假定数十纳米的碳污染膜。因此,假设模拟中使用了正确的C / NiOx / C叠层,则蒙特卡洛方法可得出正确的氧气浓度和MID膜的厚度。

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