首页> 外文期刊>Microscopy and microanalysis: The official journal of Microscopy Society of America, Microbeam Analysis Society, Microscopical Society of Canada >Exploring spatial resolution in electron back-scattered diffraction experiments via Monte Carlo simulation
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Exploring spatial resolution in electron back-scattered diffraction experiments via Monte Carlo simulation

机译:通过蒙特卡洛模拟探索电子背散射衍射实验中的空间分辨率

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A Monte Carlo model was used to simulate specimen-electron beam interactions relevant to electron back-scattered diffraction (EBSD). Electron trajectories were calculated for a variety of likely experimental conditions to examine the interaction volume of the incident electrons as well as that of the subset of incident electrons that emerge from the specimen, i.e., back-scattered electrons (BSEs). The spatial resolution of EBSD was investigated as functions of both materials properties, such as atomic number, atomic weight, and density, and experimental parameters, such as specimen thickness, tilt, and incident beam accelerating voltage. These simulations reveal that the achievable spatial resolution in EBSD is determined by these intrinsic and extrinsic parameters. [References: 14]
机译:蒙特卡洛模型用于模拟与电子背散射衍射(EBSD)有关的样品-电子束相互作用。计算各种可能的实验条件下的电子轨迹,以检查入射电子以及从样品中出来的入射电子子集(即背向散射电子(BSE))的相互作用体积。研究了EBSD的空间分辨率,这是材料性质(例如原子序数,原子量和密度)以及实验参数(例如样品厚度,倾斜度和入射光束加速电压)的函数。这些模拟表明,EBSD中可实现的空间分辨率由这些内在和外在参数决定。 [参考:14]

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