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Adhesion and contact modeling and experiments in microelectromechanical systems including roughness effects

机译:包括粗糙度效应在内的微机电系统中的附着力和接触建模以及实验

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摘要

The intermolecular adhesive forces in micro-electromechanical systems (MEMS) applications are very significant and can hinder normal operation of sensors and actuators as well as micro-engines where catastrophic adhesion and high friction could be promoted. It has been experimentally shown that surface texturing (roughening) decreases the effect of these forces. In this paper, a model that predicts the effects of roughness, on the adhesion and contact forces in MEMS interfaces is presented. The three key parameters used to characterize the roughness, the asymmetry and the flatness of a surface topography are the root-mean-square roughness (RMS), skewness and kurtosis, respectively. It is predicted that surfaces with high RMS, high kurtosis and positive skewness exhibit lower adhesion and are thus less prone to collapsing when they come into contact or near contact. Moreover, polysilicon films with different levels of roughness, asymmetry and peakiness (sharpness) were fabricated. Experiments were conducted to evaluate the adhesive pull-off forces associated with these films. The roughness characteristics of these films were also used in the model to predict the adhesive pull-off forces. Good agreement was obtained between the theoretical and experimental results. Such a model could be used to determine the critical characteristics of a microstructure prior to fabrication to prevent adhesion and lower friction in terms of surface roughness, mechanical properties and environment.
机译:微机电系统(MEMS)应用中的分子间粘合力非常重要,并且会阻碍传感器和执行器以及可能导致灾难性粘合和高摩擦的微型发动机的正常运行。实验已经表明,表面纹理化(粗糙化)可以减小这些力的作用。在本文中,提出了一个预测粗糙度对MEMS接口中的粘附力和接触力的影响的模型。用来表征表面形貌的粗糙度,不对称性和平坦度的三个关键参数分别是均方根粗糙度(RMS),偏度和峰度。可以预见,具有高RMS,高峰度和正偏度的表面会显示出较低的附着力,因此在接触或接近接触时不易塌陷。此外,制造了具有不同水平的粗糙度,不对称性和峰度(锐度)的多晶硅膜。进行实验以评估与这些膜相关的粘合剂剥离力。这些膜的粗糙度特性也用于模型中,以预测胶粘剂的剥离力。理论和实验结果之间取得了很好的一致性。这样的模型可以用于在制造之前确定微结构的关键特性,以防止在表面粗糙度,机械性能和环境方面的粘附和较低的摩擦。

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