首页> 外文期刊>Microporous and mesoporous materials: The offical journal of the International Zeolite Association >Photodegradation activity and stability of porous silicon wafers with (100) and (111) oriented crystal planes
【24h】

Photodegradation activity and stability of porous silicon wafers with (100) and (111) oriented crystal planes

机译:具有(100)和(111)取向晶面的多孔硅晶片的光降解活性和稳定性

获取原文
获取原文并翻译 | 示例
           

摘要

Hydrogen-terminated porous Si wafers with (100) and (111) oriented crystal planes were fabricated through a photo-electrochemical etching. It is found that the porosity of silicon wafers and their etch rates are determined as a function of crystal orientation. Due to the anisotropic etching behavior of single-crystal silicon, the hydrogen-terminated porous Si (100) wafers exhibit not only more excellent photodegradation activity but also stronger stability for methyl orange degradation than hydrogen-terminated porous Si (111) wafers under visible light irradiation. For the unetched Si wafers, however, the photodegradation activities of methyl orange exhibit a contrary conclusion. (C) 2014 Elsevier Inc. All rights reserved.
机译:通过光电化学蚀刻制造了具有(100)和(111)取向的晶面的氢封端的多孔硅晶片。发现硅晶片的孔隙率及其蚀刻速率是由晶体取向确定的。由于单晶硅的各向异性刻蚀行为,在可见光下,氢终止的多孔Si(100)晶片不仅表现出比氢终止的多孔Si(111)晶片更出色的光降解活性,而且甲基橙降解的稳定性更强辐射。然而,对于未蚀刻的硅晶片,甲基橙的光降解活性表现出相反的结论。 (C)2014 Elsevier Inc.保留所有权利。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号