Automating the CD-SEM recipe process for 45nm technologies

摘要

An offline recipe creation process accelerates the monitoring of hotspots in volume manufacturing at the 45nm node. The semiconductor industry is extending 193nm lithography using immersion technology in conjunction with highly restrictive design rules to successfully fabricate devices at the 45nm technology node. Unintended imperfections on the wafer due to lithography effects impact not only curvature of layout shapes but in the worst case, these unintended effects eliminate entire features on the wafer.