3D electromagnetic field simulation for low-k_1 lithography

Andreas Erdmann; Ron Gordon; Martin McCallum; Anja Rosenbusch

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3D electromagnetic field simulation for low-k_1 lithography

机译：低k_1光刻的3D电磁场仿真

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摘要

Optical simulation programs that solve Maxwell's equations can explain three-dimensional effects on advanced photomasks that impact real-world lithography, especially when using alternating phase-shifting masks.

机译：解决麦克斯韦方程组的光学仿真程序可以解释对高级光掩模的三维效应，这些效应会影响实际光刻，尤其是在使用交替相移掩模时。

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来源
《Microlithography world》 |2001年第1期|共9页
作者
Andreas Erdmann; Ron Gordon; Martin McCallum; Anja Rosenbusch;
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正文语种 eng
中图分类无线电电子学、电信技术;
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1. 3D electromagnetic field simulation for low-k_1 lithography [J] . Andreas Erdmann, Ron Gordon, Martin McCallum, Microlithography world . 2001,第1期

机译：低k_1光刻的3D电磁场仿真
2. 3D Simulation of magnetic field distribution in electromagnetic forming systems with field-shaper [J] . M. A. Bahmani, K. Niayesh, A. Karimi Journal of Materials Processing Technology . 2009,第5期

机译：具有场整形器的电磁成型系统中磁场分布的3D模拟
3. SIMULATION OF 3D MHD WITH FREE SURFACE USING OPEN-SOURCE EOF-LiBRARY: LEVITATING LIQUID METAL IN AN ALTERNATING ELECTROMAGNETIC FIELD [J] . J. Vencels, A. Jakovics, V. Geza Magnetohydrodynamics . 2017,第4期

机译：采用开源eof-library的自由表面模拟3D MHD：悬浮电磁场中的液体金属
4. 3D Simulations of Electromagnetic Fields in Nanostructures using the Time-Harmonic Finite-Element Method [C] . Sven Burger, Lin Zschiedrich, Prank Schmidt, Modeling Aspects in Optical Metrology; Proceedings of SPIE-The International Society for Optical Engineering; vol.6617 . 2007

机译：时域有限元法对纳米结构中的电磁场进行3D模拟
5. Modeling and Simulation of Plasmonic Lithography Process with Coupling Between Electromagnetic Wave Model, Phase Field Model and Heat Transfer Model. [D] . Chao, Ion Hong. 2014

机译：等离子体波光刻工艺的电磁波模型，相场模型和热传递模型耦合建模与仿真。
6. Difficulties in applying numerical simulations to an evaluation of occupational hazards caused by electromagnetic fields [O] . Patryk Zradziński -1

机译：数值模拟在评估电磁场引起的职业危害方面的困难
7. 3D Simulations of Electromagnetic Fields in Nanostructures using the Time-Harmonic Finite-Element Method [O] . Sven Burger Ab, Lin Zschiedrich Ab, Frank Schmidt Ab, 2007

机译：时域有限元方法对纳米结构中的电磁场进行3D模拟

3D electromagnetic field simulation for low-k_1 lithography

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