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首页> 外文期刊>Micron: The international research and review journal for microscopy >A new approach to reach the best resolution of X-ray microanalysis in the variable pressure SEM
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A new approach to reach the best resolution of X-ray microanalysis in the variable pressure SEM

机译:在可变压力SEM中达到X射线显微分析最佳分辨率的新方法

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A validation of our recent new approach is presented here in order to better interpret the EDS analysis results in low vacuum SEM. This approach is based on correlation between two concepts: the electron beam skirt radius in the gas characterized by R_S and the X-ray emission volume radius in the material characterized by R_X. If R_S ≤ R_X; then the skirt impact on the analysis is null and the best possible X-ray lateral resolution within the limitations imposed by gas scattering is obtained. In order to follow the relationship between R_S and R_X, two aluminum foils with different thickness (2 μm and 20 μm) embedded separately in epoxy resin were used. The results showed the existence of the optimal experimental conditions depending on the pressure and the energy that verify the condition of R_S ≤ R_X. The experimental and simulated results show the great consistency of this approach.
机译:为了更好地解释低真空SEM中的EDS分析结果,此处提出了对我们最新方法的验证。该方法基于两个概念之间的相关性:以R_S为特征的气体中的电子束裙半径和以R_X为特征的材料中的X射线发射体积半径。如果R_S≤R_X;则裙边对分析的影响为零,并在气体散射施加的限制范围内获得了最佳的X射线横向分辨率。为了遵循R_S和R_X之间的关系,使用了分别埋置在环氧树脂中的两种不同厚度(2μm和20μm)的铝箔。结果表明存在取决于压力和能量的最佳实验条件,这些条件验证了R_S≤R_X的条件。实验和仿真结果表明该方法具有很好的一致性。

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