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首页> 外文期刊>Metrologia: International Journal of Scientific Metrology: = Internationale Zeitschrift fur Wissenschaftliche Metrologie: = Journal International de Metrologie Scientifique >Metrological implications of recent interferometric wavelength measurements for singly ionized silicon in the vacuum ultraviolet (152 nm and 180 nm)
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Metrological implications of recent interferometric wavelength measurements for singly ionized silicon in the vacuum ultraviolet (152 nm and 180 nm)

机译:近期在紫外紫外线(152 nm和180 nm)中单离子化硅的干涉波长测量的计量学意义

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摘要

A comparison of wavelength scales derived from standard Cd, Hg and Kr lamps and the new scale derived from heterodyne frequency measurements is presented. The comparison is based on recent interferometric measurements by Griesmann and Kling of wavelengths of transitions at 152 nm and 180 nm in singly ionized silicon, which were in effect calibrated by heterodyne frequency measurements. These wavelengths are in excellent agreement with results for the same lines from experiments calibrated by standard hollow cathode lamps.
机译:给出了从标准Cd,Hg和Kr灯得出的波长标度与从外差频率测量得出的新标度的比较。该比较基于格里斯曼(Griesmann)和克林(Kling)最近对单电离硅中152 nm和180 nm跃迁波长的干涉测量,该测量实际上通过外差频率测量进行了校准。这些波长与通过标准空心阴极灯校准的实验得到的相同谱线的结果非常吻合。

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