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First-principles investigation of the role of registry relaxations on stepped Cu(100) surfaces

机译:阶梯式Cu(100)表面注册弛豫作用的第一性原理研究

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The multilayer relaxations of the (311), (511), (711), and (911) Cu surfaces are investigated using the all-electron full-potential linearized augmented plane-wave (FLAPW) method. We found relaxation sequences like -+-(...), --+-(...), ---+-(...), and ----+-(...) for (311), (511), (711), and (911), respectively, where the - and + signs indicate contraction and expansion, respectively, of the interlayer spacing. Furthermore, we found that the first-neighbor distances between the Cu atoms in the step edges do not depend on the surface termination, i.e., d(SC-CC) is the same for all studied surfaces. Our FLAPW relaxation sequences are in full agreement with quantitative low-energy electron diffraction (LEED) results, as well as with the multilayer relaxation-coordination trend proposed recently. However, large discrepancies are found for the magnitude of the interlayer relaxations, particularly for those involving atoms at the step edges. From our calculations, we suggest that these discrepancies are due to the fact that the atomic displacements parallel to the surface were not take into account in the quantitative analysis of the LEED intensities, which we found to play an important role for a quantitative description of the stepped Cu (2n-1, 11) surfaces.
机译:采用全电子全势线性化增强平面波(FLAPW)方法研究了(311)、(511)、(711)和(911)Cu表面的多层弛豫。我们分别发现了 (311)、(511)、(711) 和 (911) 的弛豫序列,如 -+-(...)、--+-(...)、---+-(...) 和 ----+-(...),其中 - 和 + 符号分别表示层间距的收缩和膨胀。此外,我们发现阶梯边缘中Cu原子之间的第一邻距离不依赖于表面端接,即d(SC-CC)对于所有研究的表面都是相同的。我们的FLAPW弛豫序列与定量低能电子衍射(LEED)结果以及最近提出的多层弛豫配位趋势完全一致。然而,发现层间弛豫的幅度存在很大差异,特别是对于涉及阶梯边缘原子的弛豫。根据我们的计算,我们认为这些差异是由于在LEED强度的定量分析中没有考虑平行于表面的原子位移,我们发现这对于阶梯式Cu(2n-1,11)表面的定量描述起着重要作用。

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