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首页> 外文期刊>Materials science in semiconductor processing >Effect of post-growth annealing on the structural, optical and electrical properties of V2O5 nanorods and its fabrication, characterization of V2O5/p-Si junction diode
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Effect of post-growth annealing on the structural, optical and electrical properties of V2O5 nanorods and its fabrication, characterization of V2O5/p-Si junction diode

机译:生长后退火对V2O5纳米棒的结构,光学和电学性质的影响及其制造,V2O5 / p-Si结二极管的表征

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We report the synthesis of V2O5 nanorods by utilizing simple wet chemical strategy with ammonia meta vanadate (NH4VO3) and polyethylene glycol (PEG) exploited as precursor and surfactant agent, respectively. The effect of post-annealing on structural, optical and electrical properties of V2O5 nanorods was characterized by XRD, HRSEM-EDX, TEM, FT-IR, UV (DRS), PL, TG-DTA and DC conductivity studies. The X-ray diffraction analysis revealed that the prepared sample annealed at 150 degrees C for 5 h which exhibited anorthic phase of V5O9 and annealed at 300-600 degrees C showed the anorthic phase change to orthorhombic phase of V2O5 due to the post-annealing effect. The surface morphology results indicated that increasing temperature caused a change from microrods to a nanorods shape in the morphology of V2O5. FT-IR spectrum confirmed that the presence of V2O5 functional groups and the formation of V-O bond. The optical band gap was found in the range 2.5-2.48 eV and observed to decreases with various annealed temperature. The DC electrical conductivity was studied as a function of temperature which indicated the semiconducting nature. Further, the potential of V2O5 nanostructures were grown on the p-Si substrate using the nebulizer spray technique. The junction properties of the V2O5/p-Si diode were evaluated by measuring current (I)-voltage (V) and AC characteristics. (C) 2015 Published by Elsevier Ltd.
机译:我们报告了利用简单的湿化学策略,分别将偏钒酸氨(NH4VO3)和聚乙二醇(PEG)用作前体和表面活性剂,合成了V2O5纳米棒。通过XRD,HRSEM-EDX,TEM,FT-IR,UV(DRS),PL,TG-DTA和DC电导率研究来表征后退火对V2O5纳米棒的结构,光学和电学性质的影响。 X射线衍射分析表明,所制得的样品在150℃下退火5 h,表现出V5O9的原相,在300-600℃下退火,由于后退火作用,其原相变成V2O5的正交相。 。表面形态结果表明,温度升高导致V2O5形态从微棒形变为纳米棒形。 FT-IR光谱证实了V 2 O 5官能团的存在和V-O键的形成。发现光学带隙在2.5-2.48eV的范围内,并且观察到随着各种退火温度而减小。研究了直流电导率随温度的变化,表明了半导体的性质。此外,使用雾化器喷涂技术在p-Si衬底上生长了V2O5纳米结构的潜力。通过测量电流(I)-电压(V)和AC特性来评估V2O5 / p-Si二极管的结性质。 (C)2015由Elsevier Ltd.出版

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