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Kinetics of light-induced degradation in compensated boron-doped silicon investigated using photoluminescence and numerical simulation

机译:利用光致发光和数值模拟研究补偿硼掺杂硅中光致降解的动力学

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摘要

We use photoluminescence to observe light-induced degradation in silicon in real time. Numerical simulations are used to match our results and lifetime decay data from the literature with theoretical models for the generation of the light-induced boron-oxygen defects. It is found that the existing model of the slowly generated defect SRC, where its saturated concentration is a function of the majority carrier concentration, does not explain certain results in both p- and n-type samples. A new model is proposed in which the saturated SRC concentration is controlled by the total hole concentration under illumination. (C) 2015 Published by Elsevier Ltd.
机译:我们使用光致发光来实时观察光诱导的硅降解。使用数值模拟将我们的结果和文献中的寿命衰减数据与光致硼氧缺陷产生的理论模型进行匹配。发现缓慢生成的缺陷SRC的现有模型(其饱和浓度是多数载流子浓度的函数)不能解释p型和n型样品的某些结果。提出了一种新模型,其中饱和SRC浓度由光照下的总空穴浓度控制。 (C)2015由Elsevier Ltd.出版

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