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Novel EBSD preparation method for Cu/Sn microbumps using a focused ion beam

机译:聚焦离子束用于铜/锡微凸块的新型EBSD制备方法

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摘要

We proposed a novel technique developed from focused ion beam (FIB) polishing for sample preparation of electron backscatter diffraction (EBSD) measurement. A low-angle incident gallium ion beam with a high acceleration voltage of 30 kV was used to eliminate the surface roughness of cross-sectioned microbumps resulting from mechanical polishing. This work demonstrates the application of the FIB polishing technique to solders for a high-quality sample preparation for EBSD measurement after mechanical polishing.
机译:我们提出了一种从聚焦离子束(FIB)抛光开发的新技术,用于电子背散射衍射(EBSD)测量的样品制备。使用具有30 kV的高加速电压的低角度入射镓离子束来消除由机械抛光导致的横截面微凸块的表面粗糙度。这项工作演示了FIB抛光技术在焊料上的应用,以用于在机械抛光后进行EBSD测量的高质量样品制备。

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