首页> 外国专利> CU2ZN0.14SN0.25TE2.34 NANOCRYSTALLINE SOLUTION AND PREPARATION METHOD THEREOF , PHOTOSENSITIVE RESIN SOLUTION AND BLACK MATRIX PREPARATION METHOD, AND COLOR FILM SUBSTRATE

CU2ZN0.14SN0.25TE2.34 NANOCRYSTALLINE SOLUTION AND PREPARATION METHOD THEREOF , PHOTOSENSITIVE RESIN SOLUTION AND BLACK MATRIX PREPARATION METHOD, AND COLOR FILM SUBSTRATE

机译:CU2ZN0.14SN0.25TE2.34纳米溶液及其制备方法,光敏树脂溶液和黑矩阵制备方法以及彩色底物

摘要

The present invention relates to a Cu 2 Zn 0.14 Sn 0.25 Te 2.34 nanocrystalline solution, its preparation method, a photosensitive resin solution, a method for forming black matrixes (BMs), and a color filter (CF) substrate. As the particle size of nanocrystallines in the nanocrystalline solution is small and light within the ultraviolet-visible light range can be absorbed, the BMs formed by utilization of the nanocrystalline solution can obtain good light shielding performance while having a small thickness. In the nanocrystalline solution, the particle size of the nanocrystallines dispersed in the nanocrystalline solution is 5 to 20nm; the band gap of the nanocrystallines is 0.8 to 1.5ev, and the grain surface of the nanocrystallines has organic functional groups.
机译:Cu 2 Zn 0.14 Sn 0.25 Te 2.34纳米晶溶液,其制备方法,光敏树脂溶液,黑矩阵(BMs)的形成方法和彩色滤光片(CF)基板。由于纳米晶体溶液中的纳米晶体的粒径小并且可以吸收紫外-可见光范围内的光,因此通过利用纳米晶体溶液形成的BM可以在具有小的厚度的同时获得良好的遮光性能。在纳米晶溶液中,分散在纳米晶溶液中的纳米晶的粒径为5至20nm。纳米晶体的带隙为0.8至1.5ev,并且纳米晶体的晶粒表面具有有机官能团。

著录项

  • 公开/公告号EP3157064A4

    专利类型

  • 公开/公告日2018-03-28

    原文格式PDF

  • 申请/专利权人 BOE TECHNOLOGY GROUP CO. LTD.;

    申请/专利号EP20140861163

  • 发明设计人 CUI YING;SONG YINGYING;LIU ZE;

    申请日2014-11-05

  • 分类号H01L31/0272;G03F7;G03F7/004;G03F7/105;

  • 国家 EP

  • 入库时间 2022-08-21 13:17:28

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