INFLUENCE OF ION ETCHING IN LOW PRESSURE ARC DISCHARGE IN PLASMA ON DUPLEX COAT ADHESION PRODUCED BY GAS NITRIDING AND PA PVD-ARC PROCESSES

摘要

The aim of this study was duplex process parameters optimalization where the main attention connect ion etching process of nitriding layer. The range of our works: technological experimenthals contain with ion etching generated by using Cr, Ti, V and TiAl electodes, optymalization of gas nitriding and PA PVD-Arc processes, SEM investigation of nitrided surface after ion etching, hardness and tribological investigation and adhesion and corrosion investigation. Duplex layer obtain by gas nitriding and PAPVD-Arc processes, may be used for improve mechanical, tribological and anticorrosion properties of tools, dies and machine parts. Destination of that technology is for large and middle enterprises which produce tools and special machine elements.